| Identification | More | [Name]
SILICON (IV) IODIDE | [CAS]
13465-84-4 | [Synonyms]
SILICON IODIDE
SILICON (IV) IODIDE
SILICON TETRAIODIDE
TETRAIODOSILANE
SiI4
Silane, tetraiodo-
tetraiodo-silan
Siliconiodidemetalsbasisoffwhitepowder
SILICON TETRAIODIDE, 99.9+%
Silicon(IV)iodide,99.9%(metalsbasis)
Silicon(IV)iodide(99.9%-Si)
Silicon(IV) iodide, 99% (metals basis)
Silicon(IV) iodide, 99.999% (metals basis)
Tetraiodosilicon | [EINECS(EC#)]
236-706-2 | [Molecular Formula]
I4Si | [MDL Number]
MFCD00054041 | [Molecular Weight]
535.7 | [MOL File]
13465-84-4.mol |
| Chemical Properties | Back Directory | [Appearance]
White crystals. Noncombustible.
| [Melting point ]
120 °C | [Boiling point ]
287.4 °C | [density ]
4.198 | [Fp ]
287.5°C | [form ]
Lumps | [color ]
White | [Specific Gravity]
4.198 | [Water Solubility ]
Soluble in organic solvents. Insoluble in water. | [Hydrolytic Sensitivity]
8: reacts rapidly with moisture, water, protic solvents | [Sensitive ]
Moisture Sensitive | [CAS DataBase Reference]
13465-84-4(CAS DataBase Reference) | [EPA Substance Registry System]
Silane, tetraiodo- (13465-84-4) |
| Safety Data | Back Directory | [Hazard Codes ]
T | [Risk Statements ]
R24/25:Toxic in contact with skin and if swallowed .
R34:Causes burns.
R42/43:May cause sensitization by inhalation and skin contact .
R61:May cause harm to the unborn child. | [Safety Statements ]
S26:In case of contact with eyes, rinse immediately with plenty of water and seek medical advice .
S36/37/39:Wear suitable protective clothing, gloves and eye/face protection .
S45:In case of accident or if you feel unwell, seek medical advice immediately (show label where possible) .
S53:Avoid exposure-obtain special instruction before use . | [RIDADR ]
3260 | [TSCA ]
Yes | [HazardClass ]
8 | [PackingGroup ]
II |
| Hazard Information | Back Directory | [Hazard]
Toxic by ingestion and inhalation, irritant
to tissue.
| [Chemical Properties]
White crystals. Noncombustible.
| [Uses]
Silicon(IV) iodide is used as a precursor to prepare silicon amides. It finds application in the manufacture and etching of silicon in microelectronics. |
| Questions And Answer | Back Directory | [Description]
Silicon Iodide is the iodide of silicon. It is a precursor to silicon amide. It is also applied in the manufacture and etching of silicon in microelectronics. Selective area regrowth of silicon-doped GaAs has been successfully achieved by chemical beam epitaxy (CBE) on dry etched trench structures. Silicon tetraiodide is useful for the above process in abrupt to manipulate metal-semiconductor field effect transistor (MESFET) and heterostructure field effect transistor (HFET). Silicon iodide can also be reduced as the source to form pure silicon and hydrogen iodide.
| [Reference]
- Izumi, Shigekazu, et al. Journal of Crystal Growth 175.175(1997): 404-410.
- http://jes.ecsdl.org/content/104/11/663.short
- https://en.wikipedia.org/wiki/Silicon_tetraiodide
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